Figure 38 shows the results obtained in collaboration with Toshiba Corporation. The DSA used is a Si-containing tetrablock copolymer, and the SEM photograph shows hp = 9.5 nm. In addition, DSA for 4.5 nm, 12 nm, and 50 nm were synthesized and examined for matching with NILs, and all showed good results. On the other hand, DSAs from hp = 4 to 20 nm have been developed for logic applications, and EUV + DSAs have been evaluated. Of particular note is hp = 7 nm. I dare not show SEM pictures here, but I have never seen such a beautiful L/S before. By the way, only about 20 people in the whole human race have seen this SEM photo. I don’t know if I will show it to you all.