13. Intel’s Position on EUV + DSA (cited material)

       The figures in Figure 39-41 are taken from a paper presented by Chandra Sarna et al. of Intel at the 39th International Conference of Photopolymer Science and Technology, June 2022, Japan. Although we are astonished at and respect the high level of technology of Intel researchers, the data is not as good as the hp = 7 nm data presented earlier.  On the other hand, it is noteworthy that Figure 41 requirements for HVM.  We have many years of accumulated DSA development technology and much knowledge about HVM, but unfortunately, we do not have the funds to build a factory for HVM.  We would like to ask you, regardless of your nationality or the size of your company, to invest funds in us.

Figure 39. DSA rectification and pitch scaling
Figure 40. Multipitch DSA Strategy
Figure 41. DSA ECOSYSTEM INTERACTION